dor_id: 41734

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650.#.4.x: Físico Matemáticas y Ciencias de la Tierra

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336.#.#.a: Artículo

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856.4.0.u: http://revistas.unam.mx/index.php/rmf/article/view/30599/28425

100.1.#.a: Alfonso Orjuela, J. E.; Arroyo Osorio, J. M.; Andrade Zambrano, D. F.

524.#.#.a: Alfonso Orjuela, J. E., et al. (2011). Refractive index of multiline nanosecond laser-induced periodic surface structures and porous silicon. Revista Mexicana de Física; Vol 57, No 006. Recuperado de https://repositorio.unam.mx/contenidos/41734

245.1.0.a: Refractive index of multiline nanosecond laser-induced periodic surface structures and porous silicon

502.#.#.c: Universidad Nacional Autónoma de México

561.1.#.a: Facultad de Ciencias, UNAM

264.#.0.c: 2011

264.#.1.c: 2011-01-01

653.#.#.a: Laser ablation; silicon; periodic structures; porous silicon (PS); refractive index

506.1.#.a: La titularidad de los derechos patrimoniales de esta obra pertenece a las instituciones editoras. Su uso se rige por una licencia Creative Commons BY-NC-ND 4.0 Internacional, https://creativecommons.org/licenses/by-nc-nd/4.0/legalcode.es, fecha de asignación de la licencia 2011-01-01, para un uso diferente consultar al responsable jurídico del repositorio por medio de rmf@ciencias.unam.mx

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041.#.7.h: eng

520.3.#.a: To study the effect of multiline laser processing in the optical response of silicon, a set of p-type single-crystalline silicon wafers with 0.01 to 0.02 Ωm resistivity, 525 μm thickness, and [111] orientation, was irradiated with a multiline Nd:YAG pulsed laser (1064, 532 and 355 nm) applying energies from 310 to 3100 J. A group of those surfaces was produced using argon gas blowing, while other group was manufactured in free atmosphere. Using confocal microscopy, it was observed that the gas-protected samples shown surface periodic structures in the form of ripples with an average pitch of 547 nm. Trough diffuse reflectance tests it was determined that proportionally to the energy supplied in the laser processing, these surfaces reflect between 10% and 30% in the UV region and between 60% and 80% in the IR region. On the other hand, the free atmosphere-made surfaces presented structures and diffraction properties characteristic of porous silicon (PS). The refractive index of the surfaces with periodic structures was calculated based on the diffuse reflectance measures while that of PS surfaces was calculated using the surface voids fraction (pores) determined with the confocal microscope image analysis software.

773.1.#.t: Revista Mexicana de Física; Vol 57, No 006 (2011)

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Artículo

Refractive index of multiline nanosecond laser-induced periodic surface structures and porous silicon

Alfonso Orjuela, J. E.; Arroyo Osorio, J. M.; Andrade Zambrano, D. F.

Facultad de Ciencias, UNAM, publicado en Revista Mexicana de Física, y cosechado de Revistas UNAM

Licencia de uso

Procedencia del contenido

Entidad o dependencia
Facultad de Ciencias, UNAM
Revista
Revista Mexicana de Física
Repositorio
Revistas UNAM
Contacto
Revistas UNAM. Dirección General de Publicaciones y Fomento Editorial, UNAM en revistas@unam.mx

Cita

Alfonso Orjuela, J. E., et al. (2011). Refractive index of multiline nanosecond laser-induced periodic surface structures and porous silicon. Revista Mexicana de Física; Vol 57, No 006. Recuperado de https://repositorio.unam.mx/contenidos/41734

Descripción del recurso

Autor(es)
Alfonso Orjuela, J. E.; Arroyo Osorio, J. M.; Andrade Zambrano, D. F.
Tipo
Artículo de Investigación
Área del conocimiento
Físico Matemáticas y Ciencias de la Tierra
Título
Refractive index of multiline nanosecond laser-induced periodic surface structures and porous silicon
Fecha
2011-01-01
Resumen
To study the effect of multiline laser processing in the optical response of silicon, a set of p-type single-crystalline silicon wafers with 0.01 to 0.02 Ωm resistivity, 525 μm thickness, and [111] orientation, was irradiated with a multiline Nd:YAG pulsed laser (1064, 532 and 355 nm) applying energies from 310 to 3100 J. A group of those surfaces was produced using argon gas blowing, while other group was manufactured in free atmosphere. Using confocal microscopy, it was observed that the gas-protected samples shown surface periodic structures in the form of ripples with an average pitch of 547 nm. Trough diffuse reflectance tests it was determined that proportionally to the energy supplied in the laser processing, these surfaces reflect between 10% and 30% in the UV region and between 60% and 80% in the IR region. On the other hand, the free atmosphere-made surfaces presented structures and diffraction properties characteristic of porous silicon (PS). The refractive index of the surfaces with periodic structures was calculated based on the diffuse reflectance measures while that of PS surfaces was calculated using the surface voids fraction (pores) determined with the confocal microscope image analysis software.
Tema
Laser ablation; silicon; periodic structures; porous silicon (PS); refractive index
Idioma
eng
ISSN
2683-2224 (digital); 0035-001X (impresa)

Enlaces