dor_id: 45416
506.#.#.a: Público
590.#.#.d: Los artículos enviados a la revista "Journal of Applied Research and Technology", se juzgan por medio de un proceso de revisión por pares
510.0.#.a: Scopus, Directory of Open Access Journals (DOAJ); Sistema Regional de Información en Línea para Revistas Científicas de América Latina, el Caribe, España y Portugal (Latindex); Indice de Revistas Latinoamericanas en Ciencias (Periódica); La Red de Revistas Científicas de América Latina y el Caribe, España y Portugal (Redalyc); Consejo Nacional de Ciencia y Tecnología (CONACyT); Google Scholar Citation
561.#.#.u: https://www.icat.unam.mx/
650.#.4.x: Ingenierías
336.#.#.b: article
336.#.#.3: Artículo de Investigación
336.#.#.a: Artículo
351.#.#.6: https://jart.icat.unam.mx/index.php/jart
351.#.#.b: Journal of Applied Research and Technology
351.#.#.a: Artículos
harvesting_group: RevistasUNAM
270.1.#.p: Revistas UNAM. Dirección General de Publicaciones y Fomento Editorial, UNAM en revistas@unam.mx
590.#.#.c: Open Journal Systems (OJS)
270.#.#.d: MX
270.1.#.d: México
590.#.#.b: Concentrador
883.#.#.u: https://revistas.unam.mx/catalogo/
883.#.#.a: Revistas UNAM
590.#.#.a: Coordinación de Difusión Cultural
883.#.#.1: https://www.publicaciones.unam.mx/
883.#.#.q: Dirección General de Publicaciones y Fomento Editorial
850.#.#.a: Universidad Nacional Autónoma de México
856.4.0.u: https://jart.icat.unam.mx/index.php/jart/article/view/557/553
100.1.#.a: Alvarez Romero, G. A.; Ramírez Silva, M. T.; Rojas Hernández, A.; Hernández Rodríguez, P. R.
524.#.#.a: Alvarez Romero, G. A., et al. (2005). Monitoring of the PH using ISFET sensors in electroplating processes. Journal of Applied Research and Technology; Vol. 3 Núm. 03. Recuperado de https://repositorio.unam.mx/contenidos/45416
245.1.0.a: Monitoring of the PH using ISFET sensors in electroplating processes
502.#.#.c: Universidad Nacional Autónoma de México
561.1.#.a: Instituto de Ciencias Aplicadas y Tecnología, UNAM
264.#.0.c: 2005
264.#.1.c: 2005-12-01
653.#.#.a: ISFET; Electroplating; Sensor
506.1.#.a: La titularidad de los derechos patrimoniales de esta obra pertenece a las instituciones editoras. Su uso se rige por una licencia Creative Commons BY-NC-SA 4.0 Internacional, https://creativecommons.org/licenses/by-nc-sa/4.0/legalcode.es, para un uso diferente consultar al responsable jurídico del repositorio por medio del correo electrónico gabriel.ascanio@icat.unam.mx
884.#.#.k: https://jart.icat.unam.mx/index.php/jart/article/view/557
001.#.#.#: 074.oai:ojs2.localhost:article/557
041.#.7.h: eng
520.3.#.a: It is well known that electroplating with metals has achieved quite a significant importance and has become a lucrative area. The present paper looks at the electroplating processes as a part of the metallurgical industry that are carried out with diverse aims. The quality and characteristics of the metal deposit depend on the electrochemical conditions imposed, such as pH. During an industrial electroplating process, when an undesirable change is detected first in the metal coating attained, is a common occurrence that a complete change of the plating bath is carried out. Due to this, the application of analytical systems to enable in situ precise monitoring of any compositional changes of the bath during the electroplating process, is an unquestionable need to be carefully satisfied. The design of such systems should allow close control of the concentrations of specific components during the process, constituting thus a desirable aim entailing both, financial and time savings. In the present work, the construction of an analytical system based on the coupling of a continuous sampling system with pH ISFET sensors is described. Comparative studies between a glass electrode and the proposed analytical system in copper, silver and nickel electroplating baths are carried out.
773.1.#.t: Journal of Applied Research and Technology; Vol. 3 Núm. 03
773.1.#.o: https://jart.icat.unam.mx/index.php/jart
022.#.#.a: ISSN electrónico: 2448-6736; ISSN: 1665-6423
310.#.#.a: Bimestral
264.#.1.b: Instituto de Ciencias Aplicadas y Tecnología, UNAM
doi: https://doi.org/10.22201/icat.16656423.2005.3.03.557
harvesting_date: 2023-11-08 13:10:00.0
856.#.0.q: application/pdf
245.1.0.b: Monitoring of the PH using ISFET sensors in electroplating processes
last_modified: 2024-03-19 14:00:00
license_url: https://creativecommons.org/licenses/by-nc-sa/4.0/legalcode.es
license_type: by-nc-sa
_deleted_conflicts: 2-13644fe9a06d4800b21049c2a04d7a7d
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