dor_id: 4107765

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856.4.0.u: https://rmf.smf.mx/ojs/rmf/article/view/Vol.%2064%2C%20Issue%206%2C%20pp.%20559-565/299; https://rmf.smf.mx/ojs/rmf/article/downloadSuppFile/Vol.%2064%2C%20Issue%206%2C%20pp.%20559-565/297

100.1.#.a: Vásquez A., M. A.; Romero Paredes, G.; Peña Sierra, Ram

524.#.#.a: Vásquez A., M. A., et al. (2018). Electrical transport phenomena in nanostructured porous-silicon films. Revista Mexicana de Física; Vol 64, No 6 Nov-Dec: 559-565. Recuperado de https://repositorio.unam.mx/contenidos/4107765

245.1.0.a: Electrical transport phenomena in nanostructured porous-silicon films

502.#.#.c: Universidad Nacional Autónoma de México

561.1.#.a: Facultad de Ciencias, UNAM

264.#.0.c: 2018

264.#.1.c: 2018-10-31

653.#.#.a: Porous silicon films, metal-insulator-metal structures, Electrical characteristics, Space charge limited current (SCLC), VTFL, electronic transport in interface structures.

506.1.#.a: La titularidad de los derechos patrimoniales de esta obra pertenece a las instituciones editoras. Su uso se rige por una licencia Creative Commons BY-NC-ND 4.0 Internacional, https://creativecommons.org/licenses/by-nc-nd/4.0/legalcode.es, fecha de asignación de la licencia 2018-10-31, para un uso diferente consultar al responsable jurídico del repositorio por medio de rmf@ciencias.unam.mx

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001.#.#.#: oai:ojs.rmf.smf.mx:article/275

041.#.7.h: eng

520.3.#.a: The charge transport mechanisms in nanostructured porous silicon (PS) films were studied through current-voltage (I-V) measurements of planar Au/PS/Au structures at 300 K. The films were formed by electrochemical etching of 1-5 Ω-cm p-type Si (100) wafers producing PS layers of 4.48 x 109 Ω-cm. The charge transport is limited both by the space charge limited currents (SCLC) and the carrier trapping-detrapping kinetics in the inherent localized PS energy levels. I-V characteristics evolve according to the trapping-detrapping carrier kinetics in the PS films showing that the electrical current can be controlled by applying external electric fields. An equivalent trap filling limiting voltage (VTFL) was identified that shifts between 1 and 3 volts by the carrier trapping-detrapping kinetics from the PS intrinsic defect states. An energy band diagram for the PS films is schematically depicted including the influence of the intrinsic PS defect states. To give a reasonable explanation of the found behavior the existence of a thin silicon oxide film covering the network-like-silicon-nanocrystallites is required, in agreement with the widely accepted PS structural models.

773.1.#.t: Revista Mexicana de Física; Vol 64, No 6 Nov-Dec (2018): 559-565

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046.#.#.j: 2020-11-25 00:00:00.000000

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doi: https://doi.org/10.31349/RevMexFis.64.559

handle: 00b1975785c981fc

harvesting_date: 2020-09-23 00:00:00.0

856.#.0.q: application/pdf

last_modified: 2020-11-27 00:00:00

license_url: https://creativecommons.org/licenses/by-nc-nd/4.0/legalcode.es

license_type: by-nc-nd

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Artículo

Electrical transport phenomena in nanostructured porous-silicon films

Vásquez A., M. A.; Romero Paredes, G.; Peña Sierra, Ram

Facultad de Ciencias, UNAM, publicado en Revista Mexicana de Física, y cosechado de Revistas UNAM

Licencia de uso

Procedencia del contenido

Entidad o dependencia
Facultad de Ciencias, UNAM
Revista
Repositorio
Contacto
Revistas UNAM. Dirección General de Publicaciones y Fomento Editorial, UNAM en revistas@unam.mx

Cita

Vásquez A., M. A., et al. (2018). Electrical transport phenomena in nanostructured porous-silicon films. Revista Mexicana de Física; Vol 64, No 6 Nov-Dec: 559-565. Recuperado de https://repositorio.unam.mx/contenidos/4107765

Descripción del recurso

Autor(es)
Vásquez A., M. A.; Romero Paredes, G.; Peña Sierra, Ram
Tipo
Artículo de Investigación
Área del conocimiento
Físico Matemáticas y Ciencias de la Tierra
Título
Electrical transport phenomena in nanostructured porous-silicon films
Fecha
2018-10-31
Resumen
The charge transport mechanisms in nanostructured porous silicon (PS) films were studied through current-voltage (I-V) measurements of planar Au/PS/Au structures at 300 K. The films were formed by electrochemical etching of 1-5 Ω-cm p-type Si (100) wafers producing PS layers of 4.48 x 109 Ω-cm. The charge transport is limited both by the space charge limited currents (SCLC) and the carrier trapping-detrapping kinetics in the inherent localized PS energy levels. I-V characteristics evolve according to the trapping-detrapping carrier kinetics in the PS films showing that the electrical current can be controlled by applying external electric fields. An equivalent trap filling limiting voltage (VTFL) was identified that shifts between 1 and 3 volts by the carrier trapping-detrapping kinetics from the PS intrinsic defect states. An energy band diagram for the PS films is schematically depicted including the influence of the intrinsic PS defect states. To give a reasonable explanation of the found behavior the existence of a thin silicon oxide film covering the network-like-silicon-nanocrystallites is required, in agreement with the widely accepted PS structural models.
Tema
Porous silicon films, metal-insulator-metal structures, Electrical characteristics, Space charge limited current (SCLC), VTFL, electronic transport in interface structures.
Idioma
eng
ISSN
2683-2224 (digital); 0035-001X (impresa)

Enlaces